TOK i-Line Photoresist Solutions
TOK manufactures i-Line photoresist materials for applications with film thickness from 0.3um to 7um for the 365nm wavelength. We manufacture both positive and negative photo resists in our i-Line product lineup. TOK i-Line photoresists are manufactured in our facilities in the US as well as in Japan. If you have a project and are searching for an i-Line photoresist solution, please contact us and we can provide more specific data about our product lineup.
